- Growth Method: CVD synthesis in high temperature reactor (either AIXTRON or CVD Equipment / First Nano)
- Growth substrates: Copper (standard), Germanium (for applications where metal contamination is undesirable), Nickel and others
- Transfer Method: High-Speed electrochemical delamination. More info: Properties of Chemical Vapour Deposition Graphene Transferred by High-Speed Electrochemical Delamination
- Coverage >99.5% (please see attached images from optical microscope)
- Number of graphene layers: 1, multiple transfer available – please contact for custom samples.
- Grain size: Up to 1 mm
- Appearance (Colour): Transparent
- Transparency of single Graphene layer: >97%
- Standard quality check: Raman spectroscopy at single point
- Optional measurements: please check “Research Services”
Parameters dependent on the substrate (PET foil):
- Standard sizes: 10 mm x 10 mm, 1”x 1”, 2” x 2”, (Other sizes available on request)
- Hall mobility at 300K: 3500±500 cm2/Vs
- Charge Density: 1-3 x E12
- Average Sheet Resistance of single graphene layer: ~900 Ohms/sq (1cm x1cm)
- Coverage: >99,5%
- PET foil thickness: 0,125 mm (Other sizes available on request)